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UltraFast Innovations (UFI) EUV Attosecond Multilayer Mirrors

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  • Designed for 330 Attosecond Pulses @ 65eV (19nm)
  • Multilayer Coating with 38% Peak Reflectivity
  • ≤1Å Surface Roughness Superpolished Substrates
  • EUV Flat Mirrors and EUV Spherical Mirrors Designed at 13.5nm Also Available

UltraFast Innovations (UFI) Extreme Ultraviolet (EUV) Attosecond Multilayer Mirrors are designed for steering, focusing, and shaping attosecond pulses. Their multilayer coating is centered at 65eV (19nm) with a 6eV (1.8nm) bandwidth and provides a peak reflectivity of 38% for s-polarized light. These mirrors support EUV pulses with a temporal duration of 330 attoseconds. UFI Extreme Ultraviolet (EUV) Attosecond Mirrors are ideal for attosecond pulse generation and shaping based on high harmonic generation (HHG), free electron lasers (FELs), or other quantum optical applications. Flat and concave mirrors with a 25.4mm diameter are available; please contact us if your application requires an EUV multilayer mirror with a customized center energy, bandwidth, or other specifications.

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