- High Performance Phase Modulation up to 1MHz
- >98% Transmission from UV to NIR Spectra
- >10 J/cm2 Damage Threshold
- Ideal for Q-switching, Pulse Picking, and Laser Power Control
- High Reflectivity at 1030nm and High Transmission at 940nm
- Low Group Delay Dispersion (GDD) <±100fs2
- Dichroic Mirror Ideal for Ytterbium (Yb) Lasers
- Thin 1mm Design for Space and Weight Constrained Applications
- Uncoated First Surface Provides Fresnel Reflection
- AR Coated Second Surface Provides High Transmission
- High Laser Damage Threshold to Prevent Laser Ablation
- Negative Group Delay Dispersion for Wavelength Ranges as Broad as 650-1350nm with Minimal Third Order Dispersion
- High Efficiency of up to 95% with No Beam Path Deviation
- No Calibration Required
- Additional Wavelength Options Available
- Contact our Ultrafast Optics Experts for Questions Regarding this Product
- Negative Group Delay Dispersion as Low as -10,000fs2 with Minimal Third Order Dispersion
- High Efficiency of up to 99.7% with No Beam Path Deviation
- No Calibration Required
- Wavelength Options Including UV, Ti:Sapphire, Yb:doped Fiber, and Mid-IR (2µm)
- Contact our Ultrafast Optics Experts for Questions Regarding this Product
- Positive Group Delay Dispersion as High as 4000 fs2 with Minimal Third Order Dispersion
- High Efficiency of up to 95% with No Beam Path Deviation
- No Calibration Required
- Variable Ultrafast Pulse Compressors Available
- Contact our Ultrafast Optics Experts for Questions Regarding this Product
- Preserves Incident Circular Polarization at 45° AOI
- Up To 99.9% Reflection at 532 or 1064nm, and 80% at 650nm for Alignment
- 12.7, 25.4, and 50.8mm Designs Available
- GDD as Low as ±20fs2 at Design Wavelength Range
- Greater than 99.9% Reflectivity
- Ideal for Ti:sapphire and Yb:doped Ultrafast Lasers
- >99.8% Reflectivity at 1310nm
- 99.5% Average Reflectivity in the 1295 - 1325nm Range
- High Laser Damage Threshold
- Wide Range of Laser Line Mirrors Options Available
- >99.8% Absolute Reflectivity at 920nm
- 99.5% Average Reflectivity in the 905 - 935nm Range
- High Laser Damage Threshold
- Wide Range of Laser Line Mirrors Options Available
- >99.8% Reflectivity at 2µm
- 99.5% Average Reflectivity in the 1900 - 2200nm Range
- High Laser Damage Threshold
- Wide Range of Laser Line Mirrors Options Available
- >99.5% Reflectivity at Design Wavelengths
- Low Coefficient of Thermal Expansion
- 532/1064nm or 635/670/1064nm Wavelength Bands
- >99.5% Reflectivity at 755nm and >90% Reflectivity at 625 – 650nm
- 10-5 Surface Quality and λ/10 Surface Flatness
- Ideal for use in Dermatological Applications
- High Precision Fused Silica Mirror Substrates
- Large Selection of Diameters and Focal Lengths
- Custom Coating Options Available
- >99.8% Reflectivity at Ti:Sapphire Fundamental and Harmonic Frequencies
- 10-5 Surface Quality for Reduced Scatter in Laser Applications
- High Laser Damage Threshold
- Designed For 369nm Ion Fluorescence Wavelengths
- High Numerical Aperture and Diffraction Limited Performance
- Ideal for Ytterbium (Yb+) Ion Quantum Computing and Sensing Applications
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