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About Edmund Optics / Press Releases / Press Releases / Fused Silica Wafers Exhibit less than 10Å Surface Roughness

Fused Silica Wafers Exhibit less than 10Å Surface Roughness

Can be Used to Measure the Quality of Optical Coatings
7/8/2014, Barrington, NJ USA   —

Edmund Optics® (EO), the premier provider of optical components, introduces new TECHSPEC® Fused Silica Wafers. These versatile wafers are thin, circular pieces of UV fused silica designed to be used as test substrates to measure the quality of optical coatings. Fused Silica Wafers are also outstanding for use as dummy components for set-up processes, as well as for semiconductor microlithography or for micro-electronic-optical applications (MEMS).

Ultrasonically cleaned

Edmund Optics’ Fused Silica Wafers Exhibit less than 10Å Surface Roughness with a surface quality of 40-20. Each Fused Silica Wafer has been ultrasonically cleaned and is delivered in contaminant-free packaging to ensure highest quality.

Available in 100 mm, 200 mm and 300 mm diameters

Edmund Optics’ Fused Silica Wafers are available in 100mm, 200mm and 300mm diameter sizes. RoHS compliant, all have thicknesses of 1.00mm and a transmission range of 0.2-2.2μm. Fused Silica Wafers are in-stock and available for immediate delivery for fast turnaround and excellent value.

Offered uncoated or with multiple anti-reflection coating options for the UV, visible, or IR spectrum. Check out our selection of germanium, silicon, N-BK7, UV fused silica, zinc selenide, and more.

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Application Notes
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