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UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors

UltraFast Innovations (UFI) 800nm Highly-Dispersive Ultrafast Mirrors
UltraFast Innovations (UFI) 800nm Highly-Dispersive Ultrafast Mirrors

UltraFast Innovations (UFI) 800nm Highly-Dispersive Ultrafast Mirrors

UltraFast Innovations (UFI) 800nm Highly-Dispersive Ultrafast Mirrors

  • Reflection >99.8% (P-polarization) at 720 – 840nm or 780 – 830nm
  • Low Group Delay Dispersion at 5° or 20° AOIs 
  • Ideal for Pulse Compression of Ti:sapphire Ultrafast Lasers
  • Low GDD Mirrors Also Available
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UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors feature an optimized multilayer ultrafast chirped coating based on dispersive optical interference that provides a low group delay dispersion (GDD) and high reflectance. These ultrafast mirrors provide GDDs as low as -1300fs2 and greater than 99.8% reflectivity for p-polarization. The highly-dispersive design of these ultrafast mirrors offers control of third and higher order dispersions, and provides high beam stability at either 5° or 20° angle of incidence. UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors are ideal for pulse compression and dispersion compensation of ultrafast pulses, such as Ti:sapphire lasers. Standard imperial sizes are available, featuring fused silica substrates.

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