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II-VI LightSmyth™ Nanopatterned Silicon Stamps

II-VI LightSmyth™ Nanopatterned Silicon Stamps

II-VI LightSmyth™ Nanopatterned Silicon Stamps

  • Nanoscale-Textured Grooved Surfaces
  • Variable Groove Period and Groove Depth
  • Ideal for Nanophotonics Research Applications
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II-VI LightSmyth™ Nanopattern Silicon Stamps consist of nanoscale-textured surfaces patterned on single-crystal silicon substrates. Through reactive ion etching, linear grooves with a trapezoidal cross-section are etched into the substrate surface, resembling conventional gratings. The etching process enables different period and depth specifications for these grooves, as well as more complex patterns such as lattices. II-VI LightSmyth™ Nanopattern Silicon Stamps are ideal for nanophotonics research applications in the fields of optics and photonics, biology, chemistry, nanoimprinting, and microfluidics.

SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Top Down)
SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Top Down)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Top Down)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Top Down)
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